Solution-Processed Low-Dimensional Nanomaterials for Wafer-Scale Electronics
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The emergence of nanomaterials provides various advantages to alternate the conventional silicon-based electronic materials platform, such as relatively simple processing, CMOS compatibility, unique properties originated from confined structures, and a wide range of materials selection. For practical high-performance electronic applications, it is highly required to produce large quantity nanomaterials with high structural purity. Although solution-processing approaches for isolating large quantities of nanomaterials have emerged as a scalable production approach, they typically lack control over the materials purity, resulting in polydisperse dispersions with heterogeneous properties. To overcome the limitations, firstly, I will introduce a post-synthetic process, density gradient ultracentrifugation, to achieve high structural purity. Also, I will show our recent progress on the electrochemical exfoliation and the wafer-scale electronic applications. From the results, future directions and outlook will be further discussed for the next generation of electronics beyond Moore¡¯s law.